Maskless EUV Lithography: An Alternative to E-Beam

Semiconductor manufacturing depends on lithography: the process of transferring tiny circuit patterns onto a silicon wafer. Conventional extreme-ultraviolet (EUV) lithography projects light with a wavelength of 13.5 nanometers through a reflective optical system, using a custom photomask to define each layer. It can … Read More The post Maskless EUV Lithography: An Alternative to E-Beam appeared first on SemiWiki .